Characterization of AlGaN/GaN high electron mobility transistors on GaN substrates with different thicknesses of GaN channel and buffer layers using side-gate modulation

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چکیده

Abstract AlGaN/GaN high electron mobility transistors (HEMTs) on GaN substrates with different thicknesses of channel and C-doped buffer layers were fabricated characterized conventional DC side-gate (SG) measurements. In SG measurement, drain current ( I D ) was measured while bias V applied through a separate contact that surrounds the device active region. Whereas all HEMTs have comparable measurement results (?500 mA mm ?1 , ?2 threshold voltage ?130 mS transconductance), measurements show drastically performances among samples. Comparing without layer, demonstrate HEMT doped stable against modulation until ?15 whereas modulated near 0 V, hence unstable bias. thicknesses, thicker 900 nm more resistant to than thinner 100 channel. Therefore, these highlight importance doping thickness stability.

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ژورنال

عنوان ژورنال: Japanese Journal of Applied Physics

سال: 2021

ISSN: ['0021-4922', '1347-4065']

DOI: https://doi.org/10.35848/1347-4065/ac19fc